High-throughput, nondestructive assessment of defects in patterned epitaxial films on silicon by machine learning-enabled broadband plasma optical measurements
- Shravan Matham
- C. Durfee
- et al.
- 2019
- ASMC 2019
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7 results for B. Mendoza
Study of titanium nitride underlayer properties and its influence on tungsten growth
- Shanti Pancharatnam
- J. Wynne
- et al.
- 2018
- ASMC 2018
Development of TiO2 containing hardmasks through PEALD deposition
- Anuja De Silva
- Indira Seshadri
- et al.
- 2017
- SPIE Advanced Lithography 2017
Advanced in-line metrology strategy for self-aligned quadruple patterning
- Robin Chao
- Mary Breton
- et al.
- 2016
- SPIE Advanced Lithography 2016
Study of TiN and TaN underlayer properties and their influence on W growth
- Shanti Pancharatnam
- Gabriel Rodriguez
- et al.
- 2019
- IEEE Trans Semicond Manuf
Development of TiO2 containing hardmasks through plasma-enhanced atomic layer deposition
- Anuja De Silva
- Indira Seshadri
- et al.
- 2017
- J. Micro/Nanolithogr. MEMS MOEMS
Study of alternate hardmasks for extreme ultraviolet patterning
- Anuja De Silva
- Indira Seshadri
- et al.
- 2016
- JVSTB