Better on wafer performance and mask manufacturability of contacts with no or non-traditional serifs
- Donald Samuels
- Ian Stobert
- 2007
- SPIE Photomask Technology + EUV Lithography 2007
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8 results for Donald Samuels
Characterization of Across-device Linewidth Variation (ADLV) for 65 nm logic SRAM using CDSEM and linewidth roughness algorithms
- W. Chu
- C. Radens
- et al.
- 2006
- SPIE Advanced Lithography 2006
Image fidelity verification - ContourIFV
- Ioana Graur
- Rama N. Singh
- et al.
- 2004
- AMM 2004
Approach to pattern aspect ratio control
- A. Thomas
- Franz Zach
- et al.
- 1999
- SPIE Advanced Lithography 1999
Electrical characterization of across-field lithographic performance for 256m bit dram technologies
- Junichiro Iba
- Kohji Hashimoto
- et al.
- 1995
- SPIE Photomask Japan 1995
Optimization of resolution-enhanced photolithography for a 256Mb DRAM cell
- R. Ferguson
- Christopher P. Ausschnitt
- et al.
- 1994
- VLSI Technology 1994
Level-specific lithography optimization for 1-Gb DRAM
- Alfred K. Wong
- Richard Ferguson
- et al.
- 2000
- IEEE Trans Semicond Manuf
The application of deep UV phase shifted-single layer halftone reticles to 256 mbit dynamic random access memory cell patterns
- Kohji Hashimoto
- Donald J. Samuels
- et al.
- 1994
- Japanese Journal of Applied Physics