The effect of the OPC parameters on the performance of the OPC modelAmr AbdoAhmed Seoudet al.2007SPIE Photomask Technology + EUV Lithography 2007
Setting MRC rules: Balancing inspection capabilities, defect sensitivity and OPCIan StobertJames Bruceet al.2007SPIE Advanced Lithography 2007
The effect of OPC optical and resist model parameters on the model accuracy, run time, and stabilityAmr AbdoRami Fathyet al.2006SPIE Photomask Technology 2006