Modeling of variation in submicrometer CMOS ULSI technologies
- Scott K. Springer
- Sungjae Lee
- et al.
- 2006
- IEEE Transactions on Electron Devices
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48 results for E. Nowak
Status and direction of communication technologies - SiGe BiCMOS and RFCMOS
- Alvin J. Joseph
- David L. Harame
- et al.
- 2005
- Proceedings of the IEEE
Scaling planar silicon devices
- Ching-Te Chuang
- Kerry Bernstein
- et al.
- 2004
- IEEE Circuits and Devices Magazine
Turning silicon on its edge
- Edward J. Nowak
- Ingo Aller
- et al.
- 2004
- IEEE Circuits and Devices Magazine
Extension and source/drain design for high-performance FinFET devices
- Jakub Kedzierski
- Meikei Ieong
- et al.
- 2003
- IEEE Transactions on Electron Devices
Device scaling limits of Si MOSFETs and their application dependencies
- David J. Frank
- Robert H. Dennard
- et al.
- 2001
- Proceedings of the IEEE
RF potential of a 0.18-μm CMOS logic device technology
- Joachim N. Burghartz
- Michael Hargrove
- et al.
- 2000
- IEEE Transactions on Electron Devices
CMOS scaling into the 21st century: 0.1 μm and beyond
- Y. Taur
- Y. Mii
- et al.
- 1995
- IBM J. Res. Dev