Publications

23 results for M. Lofaro

Post Porosity Plasma Protection a new approach to integrate k 2.2 porous ULK materials
- - Theo Frot
  - Willi Volksen
  - et al.
- 2011
- IITC/MAM 2011
FinFET performance advantage at 22nm: An AC perspective
- - M. Guillorn
  - J. Chang
  - et al.
- 2008
- VLSI Technology 2008
BEOL interconnects for 45 nm node and beyond
- - R.R. Yu
  - J. Doyle
  - et al.
- 2005
- VMIC 2005