Surface and bulk chemistry of chemically amplified photoresists: Segregation in thin films and environmental stability issues
- Erin L. Jablonski
- Vivek M. Prabhu
- et al.
- 2004
- Microlithography 2004
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6 results for Sharadha Sambasivan
Near edge x-ray absorption fine structure measurements of surface segregation in 157 nm photoresist blends
- Erin L. Jablonski
- Vivek M. Prabhu
- et al.
- 2003
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
X-ray absorption spectroscopy to probe interfacial issues in photolithography
- Joseph L. Lenhart
- Daniel A. Fischer
- et al.
- 2003
- Microlithography 2003
Quantitative depth profiling of photoacid generators in photoresist materials by near-edge X-ray absorption fine structure spectroscopy
- Vivek M. Prabhu
- Sharadha Sambasivan
- et al.
- 2006
- Applied Surface Science
X-ray absorption spectroscopy to probe surface composition and surface deprotection in photoresist films
- Joseph L. Lenhart
- Daniel A. Fischer
- et al.
- 2005
- Langmuir
Probing surface and bulk chemistry in resist films using near edge x-ray absorption fine structure
- Joseph L. Lenhart
- Ronald L. Jones
- et al.
- 2002
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures