Kenneth R. Carter, Robert D. Miller, et al.
Macromolecules
The utility of near-edge x-ray absorption fine structure (NEXAFS) for providing detailed chemical information about lithographic interfaces, by focusing initially on the T-topping/closure issue and probing the surface and bulk composition of the photo-acid generator in a model resist formulation was demonstrated. In addition, the extent of deprotection at the resist surface was also studied as a function of postexposure bake time using NEXAFS. The resultant data were analyzed in detail.
Kenneth R. Carter, Robert D. Miller, et al.
Macromolecules
A.B. McLean, R.H. Williams
Journal of Physics C: Solid State Physics
Shu-Jen Han, Dharmendar Reddy, et al.
ACS Nano
Ranulfo Allen, John Baglin, et al.
J. Photopolym. Sci. Tech.