High pressure oxidation induced stress in submicron trench structures
- R. Stengl
- H.-J. Timme
- et al.
- 1996
- Applied Physics Letters
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Shallow n+ Junctions in Silicon by Arsenic Gas-Phase Doping
- J.F. DeGeolormo
- D.K. Sodana
- et al.
- 1994
- JES