In-line Raman spectroscopy for stacked nanosheet device manufacturing
- Daniel Schmidt
- C. Durfee
- et al.
- 2021
- SPIE Advanced Lithography 2021
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15 results for Daniel Schmidt
OCD enhanced: Implementation and validation of spectral interferometry for nanosheet inner spacer indentation
- Daniel Schmidt
- C. Durfee
- et al.
- 2021
- SPIE Advanced Lithography 2021
Effect of high NA "half-field" printing on overlay error
- Allen Gabor
- Martin Burkhardt
- et al.
- 2021
- SPIE Advanced Lithography 2021
Characterization of EUV image fading induced by overlay corrections using pattern shift response metrology
- Daniel Schmidt
- Roger Cornell
- et al.
- 2019
- EUVL 2019
Leakage aware Si/SiGe CMOS FinFET for low power applications
- G. Tsutsui
- C. Durfee
- et al.
- 2018
- VLSI Technology 2018