Characterization of EUV image fading induced by overlay corrections using pattern shift response metrology
- Daniel Schmidt
- Roger Cornell
- et al.
- 2019
- EUVL 2019
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15 results for Christopher Ausschnitt
High order wafer alignment in manufacturing
- Michael Pike
- Nelson Felix
- et al.
- 2012
- SPIE Advanced Lithography 2012
Advanced overlay control in volume manufacturing
- Timothy Wiltshire
- Christopher Ausschnitt
- et al.
- 2011
- ASMC 2011
Smaller, smarter, faster, and more accurate: The new overlay metrology
- 2010
- SPIE Advanced Lithography 2010
Toward perfect on-wafer pattern placement: Stitched overlay exposure tool characterization
- Christopher P. Ausschnitt
- Timothy A. Brunner
- et al.
- 2010
- SPIE Advanced Lithography 2010
Overlay characterization and matching of immersion photoclusters
- Blandine Minghetti
- Timothy Brunner
- et al.
- 2010
- SPIE Advanced Lithography 2010
Distinguishing dose, focus and blur for lithography characterization and control
- Christopher P. Ausschnitt
- Timothy A. Brunner
- 2007
- SPIE Advanced Lithography 2007
Modeling for profile-based process-window metrology
- Christopher P. Ausschnitt
- Shaunee Y. Cheng
- 2004
- Microlithography 2004
A new approach to pattern metrology
- Christopher P. Ausschnitt
- 2004
- SPIE Advanced Lithography 2004
Process window metrology
- Christopher P. Ausschnitt
- W. Chu
- et al.
- 2000
- SPIE Advanced Lithography 2000