Publications

This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.

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15 results for Christopher Ausschnitt

Optimization of resolution-enhanced photolithography for a 256Mb DRAM cell
- - R. Ferguson
  - Christopher P. Ausschnitt
  - et al.
- 1994
- VLSI Technology 1994
Quantitative stepper metrology using the focus monitor test mask
- - T.A. Brunner
  - A.L. Martin
  - et al.
- 1994
- Microlithography 1994
Characterization of wafer geometry and overlay error on silicon wafers with nonuniform stress
- - Timothy A. Brunner
  - Vinayan C. Menon
  - et al.
- 2013
- Journal of Micro/Nanolithography, MEMS, and MOEMS
Combinatorial overlay control for double patterning
- - Christopher P. Ausschnitt
  - Scott D. Halle
- 2009
- Journal of Micro/Nanolithography, MEMS, and MOEMS
Laser bandwidth and other sources of focus blur in lithography
- - Timothy Brunner
  - Daniel Corliss
  - et al.
- 2006
- Journal of Microlithography, Microfabrication and Microsystems