Optimization of resolution-enhanced photolithography for a 256Mb DRAM cell
- R. Ferguson
- Christopher P. Ausschnitt
- et al.
- 1994
- VLSI Technology 1994
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15 results for Christopher Ausschnitt
Quantitative stepper metrology using the focus monitor test mask
- T.A. Brunner
- A.L. Martin
- et al.
- 1994
- Microlithography 1994
Characterization of wafer geometry and overlay error on silicon wafers with nonuniform stress
- Timothy A. Brunner
- Vinayan C. Menon
- et al.
- 2013
- Journal of Micro/Nanolithography, MEMS, and MOEMS
Combinatorial overlay control for double patterning
- Christopher P. Ausschnitt
- Scott D. Halle
- 2009
- Journal of Micro/Nanolithography, MEMS, and MOEMS
Laser bandwidth and other sources of focus blur in lithography
- Timothy Brunner
- Daniel Corliss
- et al.
- 2006
- Journal of Microlithography, Microfabrication and Microsystems