Demonstrating the benefits of source-mask optimization and enabling technologies through experiment and simulations
- David Melville
- Alan E. Rosenbluth
- et al.
- 2010
- SPIE Advanced Lithography 2010
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28 results for Daniel Corliss
Overlay characterization and matching of immersion photoclusters
- Blandine Minghetti
- Timothy Brunner
- et al.
- 2010
- SPIE Advanced Lithography 2010
Experimental result and simulation analysis for the use of pixelated illumination from source mask optimization for 22nm logic lithography process
- Kafai Lai
- Alan E. Rosenbluth
- et al.
- 2009
- SPIE Advanced Lithography 2009
Building an immersion top coat from the ground up - Materials perspective
- Mahmoud Khojasteh
- Irene Popova
- et al.
- 2007
- SPIE Advanced Lithography 2007
Characterization of imaging performance for immersion lithography at NA=0.93
- 2006
- SPIE Advanced Lithography 2006
A year in the life of an immersion lithography alpha tool at albany NanoTech
- Michael Tittnich
- John Hartley
- et al.
- 2006
- SPIE Advanced Lithography 2006
First microprocessors with immersion lithography
- D. Gil
- T. Bailey
- et al.
- 2005
- SPIE Advanced Lithography 2005
Laser bandwidth and other sources of focus blur in lithography
- Timothy Brunner
- Daniel Corliss
- et al.
- 2006
- Journal of Microlithography, Microfabrication and Microsystems