Publications

This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.

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28 results for Daniel Corliss

Demonstrating the benefits of source-mask optimization and enabling technologies through experiment and simulations
- - David Melville
  - Alan E. Rosenbluth
  - et al.
- 2010
- SPIE Advanced Lithography 2010
Overlay characterization and matching of immersion photoclusters
- - Blandine Minghetti
  - Timothy Brunner
  - et al.
- 2010
- SPIE Advanced Lithography 2010
Experimental result and simulation analysis for the use of pixelated illumination from source mask optimization for 22nm logic lithography process
- - Kafai Lai
  - Alan E. Rosenbluth
  - et al.
- 2009
- SPIE Advanced Lithography 2009
Building an immersion top coat from the ground up - Materials perspective
- - Mahmoud Khojasteh
  - Irene Popova
  - et al.
- 2007
- SPIE Advanced Lithography 2007
Characterization of imaging performance for immersion lithography at NA=0.93
- - Dario Gil
  - Jaione Tirapu-Azpiroz
  - et al.
- 2006
- SPIE Advanced Lithography 2006
A year in the life of an immersion lithography alpha tool at albany NanoTech
- - Michael Tittnich
  - John Hartley
  - et al.
- 2006
- SPIE Advanced Lithography 2006
First microprocessors with immersion lithography
- - D. Gil
  - T. Bailey
  - et al.
- 2005
- SPIE Advanced Lithography 2005
Laser bandwidth and other sources of focus blur in lithography
- - Timothy Brunner
  - Daniel Corliss
  - et al.
- 2006
- Journal of Microlithography, Microfabrication and Microsystems