New chemistry in the i)esign of chemically amplified positive resists
- Robert D. Allen
- Quan P. Ly
- et al.
- 1993
- Microlithography 1993
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16 results for Will Conley
Designing high performance KrF and ArF single layer resists with methacrylate polymers
- Robert D. Allen
- Gregory M. Wallraff
- et al.
- 1993
- J. Photopolym. Sci. Tech.
High-speed aqueous-developing negative resist based on triflic-acid-catalyzed epoxy polymerization
- R.D. Allen
- Willard E. Conley
- et al.
- 1992
- Microlithography 1992
Aspects in the progression of materials and processes for 256Mb-DRAM and beyond
- Will Conley
- 1991
- SPIE Tutorial Texts in Optical Engineering 1991
Photoresist technology for 0.25 μm lithography
- Will Conley
- 1991
- Single Frequency Semiconductor Lasers 1991
Negative tone aqueous developable resist for photon electron and X-ray lithography
- Willard Conley
- Wayne Moreau
- et al.
- 1990
- Microlithography 1990