Design, preparation, characterization, and lithographic imaging of high performance chemically amplified deep UV resist
- Hiroshi Ito
- G. Breyta
- et al.
- 1997
- ACS Spring 1997
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16 results for Will Conley
Imaging capabilities of resist in deep ultraviolet liquid immersion interferometric lithography
- Alex K. Raub
- A. Frauenglass
- et al.
- 2004
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Deep-UV immersion interferometric lithography
- Alex K. Raub
- A. Frauenglass
- et al.
- 2004
- SPIE Advanced Lithography 2004
Liquid immersion lithography - Evaluation of resist issues
- William Hinsberg
- Gregory Wallraff
- et al.
- 2004
- Microlithography 2004
Nonchemically amplified positive photoresist for synchrotron radiation x-ray lithography
- Daniel Bucca
- A. Aviram
- et al.
- 1995
- Microlithography 1995
Improved reflectivity control of APEX-E positive tone deep-UV photoresist
- Willard Conley
- Ravindra Akkapeddi
- et al.
- 1994
- Microlithography 1994
New chemistry in the i)esign of chemically amplified positive resists
- Robert D. Allen
- Quan P. Ly
- et al.
- 1993
- Microlithography 1993
High-speed aqueous-developing negative resist based on triflic-acid-catalyzed epoxy polymerization
- R.D. Allen
- Willard E. Conley
- et al.
- 1992
- Microlithography 1992
Aspects in the progression of materials and processes for 256Mb-DRAM and beyond
- Will Conley
- 1991
- SPIE Tutorial Texts in Optical Engineering 1991
Photoresist technology for 0.25 μm lithography
- Will Conley
- 1991
- Single Frequency Semiconductor Lasers 1991