Lithographic effects of mask critical dimension error
- Alfred K. K. Wong
- Richard A. Ferguson
- et al.
- 1998
- SPIE Advanced Lithography 1998
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13 results for Alfred K. Wong
Lithographic evaluation of a DUV carbon attenuated phase shift mask
- A.C. Callegan
- K. Babich
- et al.
- 1998
- Microelectronic Engineering
Impact of attenuated mask topography on lithographic performance
- Richard A. Ferguson
- William J. Adair
- et al.
- 1994
- Microlithography 1994