Optimum mask and source patterns to print a given shape
- Alan E. Rosenbluth
- Rama N. Singh
- et al.
- 2002
- Journal of Microlithography, Microfabrication and Microsystems
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13 results for Alfred K. Wong
Zernike coefficients: Are they really enough?
- C. Progler
- Alfred K. Wong
- 2000
- SPIE Advanced Lithography 2000
Characterization of line width variation
- Alfred K. Wong
- Antoinette F. Molless
- et al.
- 2000
- SPIE Advanced Lithography 2000
Approach to pattern aspect ratio control
- A. Thomas
- Franz Zach
- et al.
- 1999
- SPIE Advanced Lithography 1999
Lithographic effects of mask critical dimension error
- Alfred K. K. Wong
- Richard A. Ferguson
- et al.
- 1998
- SPIE Advanced Lithography 1998
Impact of attenuated mask topography on lithographic performance
- Richard A. Ferguson
- William J. Adair
- et al.
- 1994
- Microlithography 1994
Linewidth variation characterization by spatial decomposition
- Alfred K. Wong
- Antoinette F. Molless
- et al.
- 2002
- Journal of Microlithography, Microfabrication and Microsystems
Optimum mask and source patterns to print a given shape
- Alan E. Rosenbluth
- Scott Bukofsky
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
Alternating phase-shifting mask with reduced aberration sensitivity: Lithography considerations
- Alfred K. Wong
- Lars W. Liebmann
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
Asymmetric biasing for subgrid pattern adjustment
- Alfred K. Wong
- Lars W. Liebmann
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering