Publications

This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.

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13 results for Alfred K. Wong

Optimum mask and source patterns to print a given shape
- - Alan E. Rosenbluth
  - Rama N. Singh
  - et al.
- 2002
- Journal of Microlithography, Microfabrication and Microsystems
Zernike coefficients: Are they really enough?
- - C. Progler
  - Alfred K. Wong
- 2000
- SPIE Advanced Lithography 2000
Characterization of line width variation
- - Alfred K. Wong
  - Antoinette F. Molless
  - et al.
- 2000
- SPIE Advanced Lithography 2000
Approach to pattern aspect ratio control
- - A. Thomas
  - Franz Zach
  - et al.
- 1999
- SPIE Advanced Lithography 1999
Lithographic effects of mask critical dimension error
- - Alfred K. K. Wong
  - Richard A. Ferguson
  - et al.
- 1998
- SPIE Advanced Lithography 1998
Impact of attenuated mask topography on lithographic performance
- - Richard A. Ferguson
  - William J. Adair
  - et al.
- 1994
- Microlithography 1994
Linewidth variation characterization by spatial decomposition
- - Alfred K. Wong
  - Antoinette F. Molless
  - et al.
- 2002
- Journal of Microlithography, Microfabrication and Microsystems
Optimum mask and source patterns to print a given shape
- - Alan E. Rosenbluth
  - Scott Bukofsky
  - et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
Alternating phase-shifting mask with reduced aberration sensitivity: Lithography considerations
- - Alfred K. Wong
  - Lars W. Liebmann
  - et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
Asymmetric biasing for subgrid pattern adjustment
- - Alfred K. Wong
  - Lars W. Liebmann
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering