Linewidth variation characterization by spatial decomposition
- Alfred K. Wong
- Antoinette F. Molless
- et al.
- 2002
- Journal of Microlithography, Microfabrication and Microsystems
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13 results for Alfred K. Wong
Optimum mask and source patterns to print a given shape
- Alan E. Rosenbluth
- Rama N. Singh
- et al.
- 2002
- Journal of Microlithography, Microfabrication and Microsystems
Alternating phase-shifting mask with reduced aberration sensitivity: Lithography considerations
- Alfred K. Wong
- Lars W. Liebmann
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
Optimum mask and source patterns to print a given shape
- Alan E. Rosenbluth
- Scott Bukofsky
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
Asymmetric biasing for subgrid pattern adjustment
- Alfred K. Wong
- Lars W. Liebmann
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
The mask error factor in optical lithography
- Alfred K. Wong
- Richard A. Ferguson
- et al.
- 2000
- IEEE Trans Semicond Manuf
Characterization of line width variation
- Alfred K. Wong
- Antoinette F. Molless
- et al.
- 2000
- SPIE Advanced Lithography 2000
Zernike coefficients: Are they really enough?
- C. Progler
- Alfred K. Wong
- 2000
- SPIE Advanced Lithography 2000
Level-specific lithography optimization for 1-Gb DRAM
- Alfred K. Wong
- Richard Ferguson
- et al.
- 2000
- IEEE Trans Semicond Manuf
Approach to pattern aspect ratio control
- A. Thomas
- Franz Zach
- et al.
- 1999
- SPIE Advanced Lithography 1999