Publications

3 results for G.Y. Lee

Aluminum dual damascene metallization for 0.175 μm DRAM generations and beyond
- - R.F. Schnabel
  - L. Clevenger
  - et al.
- 2000
- Microelectronic Engineering
Challenges of Aluminum RIE Technology at sub 0.45 μm Pitches
- - R. Ravikumar
  - R. Filippi
  - et al.
- 1999
- IITC 1999
Dielectric anti-reflection coating application in a 0.175 μm dual-damascene process
- - G.Y. Lee
  - Z.G. Lu
  - et al.
- 1998
- IITC 1998