Development of APSM resists for sub-200 nm contact holes
- M. Rajaratnam
- M. Reilly
- et al.
- 1999
- Microelectronic Engineering
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Correlation of UVIIHS resist chemistry to dissolution rate measurements
- J. Thackeray
- T.H. Fedynyshyn
- et al.
- 1996
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures