Thomas H. Baum, Carl E. Larson, et al.
Journal of Organometallic Chemistry
This paper focuses on using the resist contrast curve as a method for pre-screening resists for attenuated phase-shift mask contact hole applications. The importance of surface inhibition and high c-value in developing PSM C/H resists is revealed. These concepts are confirmed by lithographic evaluation. A good overall process window (without sidelobe printing) is demonstrated by such high c-value resists.
Thomas H. Baum, Carl E. Larson, et al.
Journal of Organometallic Chemistry
Fernando Marianno, Wang Zhou, et al.
INFORMS 2021
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
Robert W. Keyes
Physical Review B