Relative merits of [formula omitted] and [formula omitted] plasma chemistries for dry etching of magnetic random access memory device elements
- K.B. Jung
- H. Cho
- et al.
- 1999
- Journal of Applied Physics
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3 results for D. Johnson
Parametric study of NiFe and NiFeCo high density plasma etching using CO/NH3
- K.B. Jung
- J. Hong
- et al.
- 1999
- JES
Patterning of NiFe and NiFeCo in CO/NH3 high density plasmas
- K.B. Jung
- J. Hong
- et al.
- 1999
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films