High-aspect-ratio, ultrathick, negative-tone near-UV photoresist for MEMS applications
- M. Despont
- H. Lorenz
- et al.
- 1997
- MEMS 1997
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6 results for H. Lorenz
Two steps micromoulding and photopolymer high-aspect ratio structuring for applications in piezoelectric motor components
- L. Dellmann
- S. Roth
- et al.
- 1998
- Microsystem Technologies
Fabrication of photoplastic high-aspect ratio microparts and micromolds usina SU-8 UV resist
- H. Lorenz
- M. Despont
- et al.
- 1998
- Microsystem Technologies
SU-8: A low-cost negative resist for MEMS
- H. Lorenz
- M. Despont
- et al.
- 1999
- JMM
Fabrication process of high aspect ratio elastic and SU-8 structures for piezoelectric motor applications
- Laurent Dellmann
- Sylvian Roth
- et al.
- 1998
- Sensors and Actuators, A: Physical
High-aspect-ratio, ultrathick, negative-tone near-UV photoresist and its applications for MEMS
- H. Lorenz
- M. Despont
- et al.
- 1998
- Sensors and Actuators, A: Physical