Publications

216 results for Rajiv V. Joshi

Comparison of the diffusion barrier properties of tungsten films prepared by hydrogen and silicon reduction of tungsten hexafluoride
- - O. Thomas
  - A. Charai
  - et al.
- 1989
- Thin Solid Films
Ion-implantation-induced fluorine agglomeration in tungsten disilicide prepared by low-pressure chemical vapour deposition
- - C.Sture Petersson
  - Harry J. Whitlow
  - et al.
- 1989
- Nuclear Inst. and Methods in Physics Research, B
Properties of selective low pressure chemically vapor deposited tungsten films produced by hydrogen reduction in a cold wall system
- - R.V. Joshi
  - D.A. Smith
  - et al.
- 1988
- Thin Solid Films
Effect of excess silicon on behavior of LPCVD WSi_x films on silicon
- - R.V. Joshi
  - Young H. Kim
  - et al.
- 1988
- Thin Solid Films
LPCVD TUNGSTEN SILICIDE WITH TITANIUM UNDERLAYER.
- - R.V. Joshi
  - L. Krusin-Elbaum
  - et al.
- 1985
- VLSI Technology 1985
Stacking faults in WSi₂: Resistivity effects
- - F.M. d'Heurle
  - F.K. LeGoues
  - et al.
- 1986
- Applied Physics Letters