Evolution of patterning materials towards the Moore's Law 2.0 Era
- Dario L. Goldfarb
- 2022
- Japanese Journal of Applied Physics
Publications
Date
Featured collections
Popular topics
69 results for Dario Goldfarb
Stacked Silicon Microcoolers
- M. Bergendahl
- Dario Goldfarb
- et al.
- 2020
- ITherm 2020
EUV chemically amplified resist component distribution and efficiency for stochastic defect control
- Dario Goldfarb
- Olivia Wang
- et al.
- 2020
- SPIE Advanced Lithography 2020
Leveraging sub-E0 dose assessment methodology to improve EUV lithography cluster dose performance
- Chris Robinson
- Cody Murray
- et al.
- 2020
- SPIE Advanced Lithography 2020
Fundamentals of resist stochastics effect for single-expose EUV patterning
- Anuja De Silva
- Luciana Meli
- et al.
- 2019
- SPIE Advanced Lithography 2019
Patterning material challenges for improving euv stochastics
- Anuja De Silva
- Luciana Meli
- et al.
- 2019
- J. Photopolym. Sci. Tech.
Study of resist hardmask interaction through surface activation layers
- Anuja De Silva
- Luciana Meli
- et al.
- 2018
- EUVL 2018
Aqueous developers for positive tone ultrathin chemically amplified EUV resists
- Dario Goldfarb
- Bharat Kumar
- 2018
- SPIE Advanced Lithography 2018
Fundamentals of EUV resist-inorganic hardmask interactions
- Dario Goldfarb
- Martin Glodde
- et al.
- 2017
- SPIE Advanced Lithography 2017
Thermomechanical behavior of EUV pellicle under dynamic exposure conditions
- Dario Goldfarb
- Max O. Bloomfield
- et al.
- 2016
- SPIE Advanced Lithography 2016