Interfacial structure of photoresist thin films in developer solutions
- Vivek M. Prabhu
- Bryan D. Vogt
- et al.
- 2005
- Microlithography 2005
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69 results for Dario Goldfarb
Molecular resists based on Polyhedral Oligomeric Silsesquioxanes (POSS)
- Ratnam Sooriyakumaran
- Hoa Truong
- et al.
- 2005
- Microlithography 2005
Studies of acid diffusion in low Ea chemically amplified photoresists
- G.M. Wallraff
- D. Medeiros
- et al.
- 2005
- Microlithography 2005
Positive resists based on non-polymeric macromolecules
- Ratnam Sooriyakumaran
- Hoa Truong
- et al.
- 2005
- J. Photopolym. Sci. Tech.
Direct measurement of the counterion distribution within swollen polyelectrolyte films
- Vivek M. Prabhu
- Bryan D. Vogt
- et al.
- 2005
- Langmuir
X-ray absorption spectroscopy to probe surface composition and surface deprotection in photoresist films
- Joseph L. Lenhart
- Daniel A. Fischer
- et al.
- 2005
- Langmuir
Water immersion of model photoresists: Interfacial influences on water concentration and surface morphology
- Bryan D. Vogt
- Christopher L. Soles
- et al.
- 2005
- Journal of Microlithography, Microfabrication and Microsystems
Sub-50 nm half-pitch imaging with a low activation energy chemically amplified photoresist
- G.M. Wallraff
- D. Medeiros
- et al.
- 2004
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Rinse additives for defect suppression in 193 nm and 248 nm lithography
- Spyridon Skordas
- Ryan L. Burns
- et al.
- 2004
- Microlithography 2004
Rinse additives for line edge roughness control in 193 nm lithography
- Dario L. Goldfarb
- Sean D. Burns
- et al.
- 2004
- Microlithography 2004