Patterning material challenges for improving euv stochastics
- Anuja De Silva
- Luciana Meli
- et al.
- 2019
- J. Photopolym. Sci. Tech.
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69 results for Dario Goldfarb
Graded spin-on organic bottom antireflective coating for high na immersion lithography
- Dario L. Goldfarb
- Libor Vyklicky
- et al.
- 2008
- J. Photopolym. Sci. Tech.
Trilayer development for 193 nm immersion lithography
- Sean Burns
- Martin Burkhardt
- et al.
- 2007
- J. Photopolym. Sci. Tech.
Positive resists based on non-polymeric macromolecules
- Ratnam Sooriyakumaran
- Hoa Truong
- et al.
- 2005
- J. Photopolym. Sci. Tech.
Electrochemical protection of thin film electrodes in solid state nanopores
- Stefan Harrer
- Philip S. Waggoner
- et al.
- 2011
- Nanotechnology
Electrochemical characterization of thin film electrodes toward developing a DNA transistor
- Stefan Harrer
- Shafaat Ahmed
- et al.
- 2010
- Langmuir
Measurements of acid generation by extreme ultraviolet irradiation in lithographic films
- Martin Glodde
- Dario L. Goldfarb
- et al.
- 2007
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Are extreme ultraviolet resists ready for the 32 nm node?
- Karen Petrillo
- Yayi Wei
- et al.
- 2007
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Direct measurement of the counterion distribution within swollen polyelectrolyte films
- Vivek M. Prabhu
- Bryan D. Vogt
- et al.
- 2005
- Langmuir
X-ray absorption spectroscopy to probe surface composition and surface deprotection in photoresist films
- Joseph L. Lenhart
- Daniel A. Fischer
- et al.
- 2005
- Langmuir