Rinse additives for line edge roughness control in 193 nm lithography
- Dario L. Goldfarb
- Sean D. Burns
- et al.
- 2004
- Microlithography 2004
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69 results for Dario Goldfarb
Surface and bulk chemistry of chemically amplified photoresists: Segregation in thin films and environmental stability issues
- Erin L. Jablonski
- Vivek M. Prabhu
- et al.
- 2004
- Microlithography 2004
Measurements of water distribution in thin lithographic films
- Bryan D. Vogt
- Christopher L. Soles
- et al.
- 2004
- Microlithography 2004
Formation of deprotected fuzzy blobs in chemically amplified resists
- Ronald L. Jones
- Tengjiao Hu
- et al.
- 2004
- Journal of Polymer Science, Part B: Polymer Physics
Interfacial effects on moisture absorption in thin polymer films
- Bryan D. Vogt
- Christopher L. Soles
- et al.
- 2004
- Langmuir
Effect of thin-film imaging on line edge roughness transfer to underlayers during etch processes
- Dario L. Goldfarb
- Arpan P. Mahorowala
- et al.
- 2004
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Diffusion of Decamethylferrocene and Decamethylferrocenium Hexafluorophosphate in Supercritical Trifluoromethane
- Darío L. Goldfarb
- Horacio R. Corti
- 2004
- Journal of Physical Chemistry B
Electrical Conductivity of Decamethylferrocenium Hexafluorophosphate and Tetrabutylammonium Hexafluorophosphate in Supercritical Trifluoromethane
- Darío L. Goldfarb
- Horacio R. Corti
- 2004
- Journal of Physical Chemistry B
Near edge x-ray absorption fine structure measurements of surface segregation in 157 nm photoresist blends
- Erin L. Jablonski
- Vivek M. Prabhu
- et al.
- 2003
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Polymer dynamics and diffusive properties in ultra-thin photoresist films
- Christopher L. Soles
- Ronald L. Jones
- et al.
- 2003
- Microlithography 2003