Improved reflectivity control of APEX-E positive tone deep-UV photoresist
- Willard Conley
- Ravindra Akkapeddi
- et al.
- 1994
- Microlithography 1994
This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.