Defect detection strategies and process partitioning for SE EUV patterning
- Luciana Meli
- Karen Petrillo
- et al.
- 2018
- SPIE Advanced Lithography 2018
Publications
This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.
Date
Featured collections
Popular topics
5 results for Koichi Hontake
Coater/developer based techniques to improve high-resolution EUV patterning defectivity
- Koichi Hontake
- Lior Huli
- et al.
- 2017
- SPIE Photomask Technology + EUV Lithography 2017
Driving down defect density in composite EUV patterning film stacks
- Luciana Meli
- Karen Petrillo
- et al.
- 2017
- SPIE Advanced Lithography 2017
EUV patterning successes and frontiers
- Nelson Felix
- Daniel Corliss
- et al.
- 2016
- SPIE Advanced Lithography 2016
Defect detection strategies and process partitioning for single-expose EUV patterning
- Luciana Meli
- Karen Petrillo
- et al.
- 2019
- J. Micro/Nanolithogr. MEMS MOEMS