Publications

4 results for Stuart Sieg

Evaluating Novel Material Stacks Towards Gate Width Roughness Reduction
- - Gopal Kenath
  - Martin Burkhardt
  - et al.
- 2025
- SPIE Advanced Lithography + Patterning 2025
Backside power distribution for nanosheet technologies beyond 2nm
- - Ruilong Xie
  - Wonhyuk Hong
  - et al.
- 2024
- VLSI Technology and Circuits 2024
EUV Double Patterning Solution for Subtractive Metal Patterning at 18nm Pitch
- - Chris Penny
  - Koichi Motoyama
  - et al.
- 2024
- SPIE Advanced Lithography + Patterning 2024
Etch and Patterning Development for 2nm Node Nanosheet Devices
- - Eric Miller
  - Indira Seshadri
  - et al.
- 2022
- SPIE Advanced Lithography 2022