Pavlos Maniotis, Daniel M. Kuchta
J. of Opt. Comm. and Netw.
In this work, we demonstrate a self-aligned litho-etch litho-etch (SALELE) process flow for 18nm pitch patterning of subtractive Ru structures. This process combines many individual steps from a standard damascene double patterning flow with a spacer pull process to adapt it for subtractive patterning. Requiring two EUV exposures, this process flow enables a broad design space comparable to existing SALELE solutions for damascene integrations. Utilizing this process flow, we have demonstrated successful patterning of complex designs including intertwined comb-serpentines and various mixed pitch patterns. We report matched resistance for both mandrel and non-mandrel resistors. Additionally, we demonstrate equivalent yields for 1mm long intertwined comb-serpentine structures with serpentines formed from both mandrel and non-mandrel patterns.
Pavlos Maniotis, Daniel M. Kuchta
J. of Opt. Comm. and Netw.
Pavlos Maniotis, Laurent Schares, et al.
SPIE OPTO 2021
Marcelo Amaral
OSSEU 2023
Ilias Iliadis
International Journal On Advances In Networks And Services