Publications

This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.

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193 results for Christian Lavoie

In-situ characterization of ultrathin nickel silicides using 3D medium-energy ion scattering
- - Tuan T. Tran
  - Lukas Jablonka
  - et al.
- 2020
- Scientific Reports
Ultra low contact resistivities for CMOS beyond 10-nm node
- - Zhen Zhang
  - Siyuranga Obasa Koswatta
  - et al.
- 2013
- IEEE Electron Device Letters
Sharp reduction of contact resistivities by effective schottky barrier lowering with silicides as diffusion sources
- - Zhen Zhang
  - F. Pagette
  - et al.
- 2010
- IEEE Electron Device Letters
High-κ/metal-gate fully depleted SOI CMOS with single-silicide schottky source/drain with sub-30-nm gate length
- - Marwan H. Khater
  - Zhen Zhang
  - et al.
- 2010
- IEEE Electron Device Letters
An off-normal fibre-like texture in thin films on single-crystal substrates
- - C. Detavernier
  - A.S. Özcan
  - et al.
- 2003
- Nature
Ambipolar electrical transport in semiconducting single-wall carbon nanotubes
- - R. Martel
  - V. Derycke
  - et al.
- 2001
- Physical Review Letters
Ambipolar electrical transport in semiconducting single-wall carbon nanotubes
- - R. Martel
  - V. Derycke
  - et al.
- 2001
- Physical Review Letters
Impact of Nanosecond Laser Anneal on PVD Ru Films
- - D. Sil
  - Yasir Sulehria
  - et al.
- 2021
- IITC 2021
Si Incorporation Into AsSeGe Chalcogenides for High Thermal Stability, High Endurance and Extremely Low Vth Drift 3D Stackable Cross-point Memory
- - Huai-Yu Cheng
  - I. Kuo
  - et al.
- 2020
- VLSI Technology 2020
Highly-selective superconformai CVD Ti silicide process enabling area-enhanced contacts for next-generation CMOS architectures
- - Nicolas Breil
  - A. Carr
  - et al.
- 2017
- VLSI Technology 2017