A high performance BiCMOS technology using 0.25 μm CMOS and double poly 47 GHz bipolar
- G. Shahidi
- J. Warnock
- et al.
- 1992
- VLSI Technology 1992
Publications
Date
Featured collections
Popular topics
43 results for David P. Klaus
On the preparation of cross-sectional TEM samples using lithographic processing and reactive ion-etching
- J.T. Wetzel
- M. Jost
- et al.
- 1989
- Ultramicroscopy
REACTIVE ION ETCHING OF MULTI-LAYER RESIST.
- H.Y. Ng
- D.P. Klaus
- et al.
- 1986
- MRS Fall Meeting 1986