A porous SiCOH dielectric with k=2.4 for high performance BEOL interconnects
- S. Gates
- A. Grill
- et al.
- 2006
- ADMETA 2006
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44 results for M.H. Sherwood
PECVD Low-k (∼2.7) dielectric SiCOH film development and integration for 65 nm CMOS devices
- K. Ida
- S. Nguyen
- et al.
- 2005
- AMC 2005
Lower-k SiCOH integration for 65 nm ground rules
- T. Nogami
- S. Lane
- et al.
- 2005
- VMIC 2005
Low-k/copper integration scheme suitable for ULSI manufacturing from 90nm to 45nm nodes
- T. Nogami
- S. Lane
- et al.
- 2005
- Optics East 2005
Mechanistic studies of the acidolysis reactions occurring in silicon-containing bilayer photoresists
- Ilya Zharov
- Josef Michl
- et al.
- 2002
- Chemistry of Materials
Experimental realization of Shor's quantum factoring algorithm using nuclear magnetic resonance
- Lieven M. K. Vandersypen
- Matthias Breyta
- et al.
- 2001
- Nature
Non-thermal nuclear magnetic resonance quantum computing using hyperpolarized xenon
- Anne S. Verhulst
- Oskar Liivak
- et al.
- 2001
- Applied Physics Letters
Polymer design for 157 nm chemically amplified resists
- Hiroshi Ito
- Greg M. Wallraff
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
Novel fluoropolymers for use in 157 nm lithography
- Hiroshi Ito
- G.M. Wallraff
- et al.
- 2001
- J. Photopolym. Sci. Tech.
Investigation of the radical copolymerization and terpolymerization of maleic anhydride and norbornenes by an in situ 1H NMR analysis of kinetics and by the mercury method: Evidence for the lack of charge-transfer-complex propagation
- Hiroshi Ito
- Dolores Miller
- et al.
- 2000
- J Polym Sci Part A