Publications

This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.

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28 results for Catherine Labelle

Plasma induced dielectric modification: Etching challenges for 65nm and beyond technology nodes
- - N. Fuller
  - M.A. Worsley
  - et al.
- 2005
- ISTC 2005
Low-k/copper integration scheme suitable for ULSI manufacturing from 90nm to 45nm nodes
- - T. Nogami
  - S. Lane
  - et al.
- 2005
- Optics East 2005
Lower-k SiCOH integration for 65 nm ground rules
- - T. Nogami
  - S. Lane
  - et al.
- 2005
- VMIC 2005
Ash-induced modification of porous and dense SiCOH inter-level-dielectric (ILD) materials during damascene plasma processing
- - T. Dalton
  - N. Fuller
  - et al.
- 2004
- IITC 2004
CMP Challenges for Advanced Technology Nodes
- - John H Zhang
  - Haigou Huang
  - et al.
- 2017
- MRS Advances
Impact of HF-based cleaning solutions on via resistance for sub-10 nm BEOL structures
- - B. Peethala
  - F. Mont
  - et al.
- 2016
- Microelectronic Engineering
Competitive and cost effective copper/low-k interconnect (BEOL) for 28 nm CMOS technologies
- - R. Augur
  - C. Child
  - et al.
- 2012
- Microelectronic Engineering
Plasma ash processing solutions for advanced interconnect technology
- - N. Fuller
  - M.A. Worsley
  - et al.
- 2008
- Thin Solid Films