Application of the Aerial Image Measurement System (AIMSTM) to the Analysis of Binary Mask Imaging and Resolution Enhancement Techniques
- R. Martino
- R. Ferguson
- et al.
- 1994
- Microlithography 1994
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28 results for L. Liebmann
A designer's guide to subresolution lithography: Enabling the impossible to get to the 14-nm node
- Lars Liebmann
- J. Andres Torres
- 2013
- IEEE Design and Test
Co-optimization of circuits, layout and lithography for predictive technology scaling beyond gratings
- Tejas Jhaveri
- Vyacheslav Rovner
- et al.
- 2010
- IEEE TCADIS
Enabling the 70 nm technology node with 193 nm altPSM lithography
- Lars Liebmann
- Jennifer Lund
- et al.
- 2002
- Proceedings of SPIE-The International Society for Optical Engineering
CAD computation for manufacturability: Can we save VLSI technology from itself?
- Mark Lavin
- Lars Liebmann
- 2002
- IEEE/ACM International Conference on Computer-Aided Design, Digest of Technical Papers
Alternating phase-shifting mask with reduced aberration sensitivity: Lithography considerations
- Alfred K. Wong
- Lars W. Liebmann
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
Enabling alternating phase shifted mask designs for a full logic gate level: Design rules and design rule checking
- Lars Liebmann
- Jennifer Lund
- et al.
- 2001
- Proceedings - Design Automation Conference
Asymmetric biasing for subgrid pattern adjustment
- Alfred K. Wong
- Lars W. Liebmann
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering