Texture of NiSi films on Si(001), (111), and (110) substrates
- C. Detavernier
- J.L. Jordan-Sweet
- et al.
- 2008
- Journal of Applied Physics
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52 results for C. Detavernier
In-situ X-ray Diffraction study of Metal Induced Crystallization of amorphous silicon
- W. Knaepen
- C. Detavernier
- et al.
- 2008
- Thin Solid Films
The role of lattice mismatch and kinetics in texture development: Co 1-xNixSi2 thin films on Si(100)
- D. Smeets
- A. Vantomme
- et al.
- 2008
- Journal of Applied Physics
Kinetics of Ni3Si2 formation in the Ni 2Si-NiSi thin film reaction from in situ measurements
- J.A. Kittl
- M.A. Pawlak
- et al.
- 2007
- Applied Physics Letters
Stress evolution during Ni-Si compound formation for fully silicided (FUSI) gates
- C. Torregiani
- C. Van Bockstael
- et al.
- 2007
- Microelectronic Engineering
Transient and end silicide phase formation in thin film Ni/polycrystalline-Si reactions for fully silicided gate applications
- J.A. Kittl
- M.A. Pawlak
- et al.
- 2007
- Applied Physics Letters
Thin film solid-state reactions forming carbides as contact materials for carbon-containing semiconductors
- W.P. Leroy
- C. Detavernier
- et al.
- 2007
- Journal of Applied Physics
Formation and morphological stability of NiSi in the presence of W, Ti, and Ta alloying elements
- D. Deduytsche
- C. Detavernier
- et al.
- 2007
- Journal of Applied Physics
Influence of Ge substrate crystallinity on Co germanide formation in solid-state reactions
- K. Opsomer
- D. Deduytsche
- et al.
- 2007
- Applied Physics Letters
Effects of additive elements on the phase formation and morphological stability of nickel monosilicide films
- C. Lavoie
- C. Detavernier
- et al.
- 2006
- Microelectronic Engineering