E-beam writing: A next-generation lithography approach for thin-film head critical features
- R.E. Fontana
- J.A. Katine
- et al.
- 2002
- IEEE Transactions on Magnetics
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27 results for Ernst Kratschmer
Performance of Zr/O/W Schottky emitters at reduced temperatures
- H.S. Kim
- M.L. Yu
- et al.
- 1997
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Energy distributions of Zr/O/W Schottky electron emission
- H.S. Kim
- M.L. Yu
- et al.
- 1997
- Journal of Applied Physics
Electron beam technology - SEM to microcolumn
- T.H.P. Chang
- M.G.R. Thomson
- et al.
- 1996
- Microelectronic Engineering
Electron-beam microcolumns for lithography and related applications
- T.H.P. Chang
- M.G.R. Thomson
- et al.
- 1996
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Experimental evaluation of a 20×20 mm footprint microcolumn
- E. Kratschmer
- H.S. Kim
- et al.
- 1996
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Electron beam lithography of sub-0.1μm circuits
- S. Rishton
- D. Kern
- et al.
- 1989
- Microelectronic Engineering