Low-k/copper integration scheme suitable for ULSI manufacturing from 90nm to 45nm nodes
- T. Nogami
- S. Lane
- et al.
- 2005
- Optics East 2005
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13 results for P. McLaughlin
Lower-k SiCOH integration for 65 nm ground rules
- T. Nogami
- S. Lane
- et al.
- 2005
- VMIC 2005
0.18 μm high-performance logic technology
- S.W. Crowder
- S. Greco
- et al.
- 1999
- VLSI Technology 1999