Atomic layer deposition of materials for phase-change memories
- Markku Leskelä
- Viljami Pore
- et al.
- 2009
- ECS Meeting 2009
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97 results for Stephen Rossnagel
Chemical and mechanical properties of UV-cured nanoimprint resists and release layer interactions
- Frances A. Houle
- Ann Fornof
- et al.
- 2008
- SPIE Advanced Lithography 2008
Novel lithography-independent pore phase change memory
- M. Breitwisch
- T. Nirschl
- et al.
- 2007
- VLSI Technology 2007
Lower resistance scaled metal contacts to silicide for advanced CMOS
- A. Topol
- C. Sheraw
- et al.
- 2006
- VLSI Technology 2006
Thermal stress evaluation of a PCRAM material Ge2Sb 2Te5
- K.N. Chen
- L. Krusin-Elbaum
- et al.
- 2006
- NVSMW 2006
Metal-organic atomic layer deposition of metals for applications in interconnect technology
- O. Van Der Straten
- S.M. Rossnagel
- et al.
- 2005
- ECS Meeting 2005
The growth of tantalum thin films by plasma-enhanced atomic layer deposition and diffusion barrier properties
- H. Kim
- C. Cabral Jr.
- et al.
- 2002
- MRS Proceedings 2002
Properties and decomposition behaviors of reactively sputtered Pt(O) electrode materials
- K.L. Saenger
- S.M. Rossnagel
- 1999
- MRS Proceedings 1999
PLASMA EFFECTS ON FILM PROPERTIES OF MAGNETRON SPUTTERED CARBON FILMS.
- Michael A. Russak
- S.M. Rossnagel
- 1986
- Symposium on Plasma Processing 1986
EFFECTS OF SURFACE IMPURITIES AND DIFFUSION ON ION BOMBARDMENT-INDUCED TOPOGRAPHY FORMATION.
- S.M. Rossnagel
- 1985
- NATO Advanced Study Institute 1985