Publications

This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.

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57 results for Matthew Colburn

DSA via hole shrink for advanced node applications
- - Cheng Chi
  - Chi Chun Liu
  - et al.
- 2016
- SPIE Advanced Lithography 2016
DSA patterning options for FinFET formation at 7nm node
- - Chi Chun Liu
  - Elliott Franke
  - et al.
- 2016
- SPIE Advanced Lithography 2016
Plasma etch patterning of EUV lithography: Balancing roughness and selectivity trade off
- - Sebastian U. Engelmann
  - Qinghuang Lin
  - et al.
- 2016
- SPIE Advanced Lithography 2016
Thermomechanical behavior of EUV pellicle under dynamic exposure conditions
- - Dario Goldfarb
  - Max O. Bloomfield
  - et al.
- 2016
- SPIE Advanced Lithography 2016
High chi block copolymer DSA to improve pattern quality for FinFET device fabrication
- - Hsinyu Tsai
  - Hiroyuki Miyazoe
  - et al.
- 2016
- SPIE Advanced Lithography 2016
Comparison of left and right side line edge roughness in lithography
- - Lei Sun
  - Nicole Saulnier
  - et al.
- 2016
- SPIE Advanced Lithography 2016
Fin formation using graphoepitaxy DSA for FinFET device fabrication
- - Chi Chun Liu
  - Fee Li Lie
  - et al.
- 2015
- SPIE Advanced Lithography 2015
Self-aligned line-space pattern customization with directed self-assembly graphoepitaxy at 24nm pitch
- - Hsinyu Tsai
  - Hiroyuki Miyazoe
  - et al.
- 2015
- SPIE Advanced Lithography 2015
Towards production ready processing with a state-of-the-art EUV cluster
- - Karen Petrillo
  - Nicole Saulnier
  - et al.
- 2015
- SPIE Advanced Lithography 2015
EUV processing and characterization for BEOL
- - Nicole Saulnier
  - Yongan Xu
  - et al.
- 2015
- SPIE Advanced Lithography 2015