Polymer self assembly in semiconductor microelectronics
- Charles T. Black
- Ricardo Ruiz
- et al.
- 2007
- IBM J. Res. Dev
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57 results for Matthew Colburn
Global optimization of masks, including film stack design to restore TM contrast in high NA TCC's
- Alan E. Rosenbluth
- David Melville
- et al.
- 2007
- SPIE Advanced Lithography 2007
Building an immersion top coat from the ground up - Materials perspective
- Mahmoud Khojasteh
- Irene Popova
- et al.
- 2007
- SPIE Advanced Lithography 2007
Successful dual damascene integration of extreme low k materials (k < 2.0) using a novel gap fill based integration scheme
- S.V. Nitta
- S. Purushothaman
- et al.
- 2004
- IEDM 2004
Ramifications of lubrication theory on imprint lithography
- Matthew Colburn
- Byung Jin Choi
- et al.
- 2004
- Microelectronic Engineering
Ash-induced modification of porous and dense SiCOH inter-level-dielectric (ILD) materials during damascene plasma processing
- T. Dalton
- N. Fuller
- et al.
- 2004
- IITC 2004
Analysis of an extreme low-κ organosilicate dielectric film exposed to representative plasmas and to a restorative process
- M. Colburn
- S.V. Nitta
- et al.
- 2003
- AMC 2003