Analysis of an extreme low-κ organosilicate dielectric film exposed to representative plasmas and to a restorative process
- M. Colburn
- S.V. Nitta
- et al.
- 2003
- AMC 2003
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57 results for Matthew Colburn
Integration of directed self-assembly with 193 nm lithography
- Daniel P. Sanders
- Joy Cheng
- et al.
- 2010
- J. Photopolym. Sci. Tech.
Design technology co-optimization assessment for directed self-Assembly-based lithography: Design for directed self-Assembly or directed self-Assembly for design
- Kafai Lai
- Chi Chun Liu
- et al.
- 2017
- J. Micro/Nanolithogr. MEMS MOEMS
22-nm-node technology active-layer patterning for planar transistor devices
- Ryoung-Han Kim
- Steven Holmes
- et al.
- 2010
- J. Micro/Nanolithogr. MEMS MOEMS
Static and dynamic wetting characteristics of nano-patterned surfaces
- Paul M. Harder
- Timothy A. Shedd
- et al.
- 2008
- Journal of Adhesion Science and Technology
Polymer self assembly in semiconductor microelectronics
- Charles T. Black
- Ricardo Ruiz
- et al.
- 2007
- IBM J. Res. Dev
Ramifications of lubrication theory on imprint lithography
- Matthew Colburn
- Byung Jin Choi
- et al.
- 2004
- Microelectronic Engineering