Design intent optimization at the beyond 7nm node: The intersection of DTCO and EUVL stochastic mitigation techniques
- Michael Crouse
- L. Liebmann
- et al.
- 2017
- SPIE Advanced Lithography 2017
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3 results for Stephen Hsu
Dark field Double Dipole Lithography (DDL) for back-end-of-line processes
- M. Burkhardt
- Sean Burns
- et al.
- 2007
- SPIE Advanced Lithography 2007
Dark field double dipole lithography (DDL) for 45nm node and beyond
- Stephen Hsu
- Martin Burkhardt
- et al.
- 2006
- Photomask and Next-Generation Lithography Mask Technology 2006