Enhanced short-channel effects in NMOSFETs due to boron redistribution induced by arsenic source and drain implant
- D.K. Sadana
- A. Acovic
- et al.
- 1992
- IEDM 1992
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24 results for Detlev Grützmacher
Boron redistribution in arsenic-implanted silicon and short-channel effects in metal-oxide-semiconductor field effect transistors
- D.K. Sadana
- A. Acovic
- et al.
- 1992
- Applied Physics Letters
Selective growth of Si/SiGe resonant tunneling diodes by atmospheric pressure chemical vapor deposition
- A. Zaslavsky
- D.A. Grützmacher
- et al.
- 1992
- Applied Physics Letters
Characterization of devices fabricated in films grown at low temperature by atmospheric pressure CVD
- T.O. Sedgwick
- V.P. Kesan
- et al.
- 1991
- IEDM 1991