193 nm resists and lithography
- Roderick R. Kunz
- Robert D. Allen
- et al.
- 1994
- Polymers for Advanced Technologies
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99 results for Robert Allen
A method for rubber toughening powder coatings
- J.L. Hedrick
- R.D. Allen
- et al.
- 1993
- Polymer Bulletin
New chemistry in the i)esign of chemically amplified positive resists
- Robert D. Allen
- Quan P. Ly
- et al.
- 1993
- Microlithography 1993
Acid-catalyzed single-layer resists for ArF lithography
- Roderick R. Kunz
- Robert D. Allen
- et al.
- 1993
- Microlithography 1993
Designing high performance KrF and ArF single layer resists with methacrylate polymers
- Robert D. Allen
- Gregory M. Wallraff
- et al.
- 1993
- J. Photopolym. Sci. Tech.
Influence of residual solvent on the absorption of N-methylpyrrolidone by polymer films
- W.D. Hinsberg
- Scott A. MacDonald
- et al.
- 1991
- ACS Spring 1991
Methacrylate terpolymer approach in the design of a family of chemically amplified positive resists
- R.D. Allen
- G.M. Wallraff
- et al.
- 1991
- ACS Spring 1991
Chemically amplified photoresist for visible laser direct imaging
- G.M. Wallraff
- R.D. Allen
- et al.
- 1991
- ACS Spring 1991
High-speed aqueous-developing negative resist based on triflic-acid-catalyzed epoxy polymerization
- R.D. Allen
- Willard E. Conley
- et al.
- 1992
- Microlithography 1992
Acid generation and acid diffusion in photoresist films
- D.R. McKean
- R.D. Allen
- et al.
- 1992
- Microlithography 1992