Analysis and modeling of curvature in copper-based mems structures fabricated using CMOS interconnect technology
- Marie-Ange Eyoum
- Nils Hoivik
- et al.
- 2005
- TRANSDUCERS 2005
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33 results for John M. Cotte
Simultaneous fabrication of RF MEMS switches and resonators using copper-based CMOS interconnect manufacturing methods
- C.V. Jahnes
- J.M. Cotte
- et al.
- 2004
- MEMS 2004
113-GHz f T graded-base SiGe HBTs
- E.F. Crabbé
- B. Mcyerson
- et al.
- 1993
- Device Research Conference 1993
An ultra-low thermal-budget SiGe-base bipolar technology
- J.N. Burghartz
- D.A. Grützmacher
- et al.
- 1993
- VLSI Technology 1993
A SiGe-base PNP ECL circuit technology
- D.L. Harame
- J.H. Comfort
- et al.
- 1993
- VLSI Technology 1993
Dopant diffusion in silicides: Effect of diffusion paths
- Carol Stanis
- J.M. Cotte
- et al.
- 1992
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
A 26 ps self-aligned epitaxial silicon base bipolar technology
- J.H. Comfort
- P.F. Lu
- et al.
- 1990
- VLSI Technology 1990
Evaluation of o2 plasma and xef2 vapor etch release processes for rf-mems switches fabricated using cmos interconnect technology
- Christopher V. Jahnes
- Nils Hoivik
- et al.
- 2006
- TRANSDUCERS 2006
Electrochemical palladium deposition for reducing critical dimensions in nanostructures
- Asli Sahin
- Qiang Huang
- et al.
- 2014
- JES
Dielectric Charging in Electrostatically Actuated MEMS Ohmic Switches
- Zhen Peng
- Cristiano Palego
- et al.
- 2008
- IEEE T-DMR