Diffusion of dopants in tungsten disilicide: effects of diffusion paths
- O. Thomas
- G. Scilla
- et al.
- 1991
- Applied Surface Science
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33 results for John M. Cotte
Dopant incorporation in epitaxial germanium grown on Ge(100) substrates by MBE
- V.P. Kesan
- Subramanian S. Iyer
- et al.
- 1991
- Journal of Crystal Growth
A 26 ps self-aligned epitaxial silicon base bipolar technology
- J.H. Comfort
- P.F. Lu
- et al.
- 1990
- VLSI Technology 1990