Overlay improvement roadmap: Strategies for scanner control and product disposition for 5-nm overlay
- 2011
- SPIE Advanced Lithography 2011
Publications
This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.
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48 results for Scott D. Halle
Optimization of pitch-split double patterning photoresist for applications at the 16nm node
- Steven J. Holmes
- Cherry Tang
- et al.
- 2011
- SPIE Advanced Lithography 2011
Understanding the trade-offs of thinner binary mask absorbers
- Jaione Tirapu-Azpiroz
- Gregory McIntyre
- et al.
- 2010
- SPIE Photomask Technology + EUV Lithography 2010
Spatial signature in local overlay measurements - "what CD-SEM can tell us and optical measurements can not"
- Scott Halle
- Daniel Moore
- et al.
- 2010
- SPIE Advanced Lithography 2010
Demonstrating the benefits of source-mask optimization and enabling technologies through experiment and simulations
- David Melville
- Alan E. Rosenbluth
- et al.
- 2010
- SPIE Advanced Lithography 2010
SMO photomask inspection in the lithographic plane
- Emily Gallagher
- Karen Badger
- et al.
- 2009
- SPIE Photomask Technology + EUV Lithography 2009
22 nm technology node active layer patterning for planar transistor devices
- Ryoung-Han Kim
- Steven Holmes
- et al.
- 2009
- SPIE Advanced Lithography 2009
Experimental result and simulation analysis for the use of pixelated illumination from source mask optimization for 22nm logic lithography process
- Kafai Lai
- Alan E. Rosenbluth
- et al.
- 2009
- SPIE Advanced Lithography 2009
32 NM Logic patterning options with immersion lithography
- K. Lai
- S. Burns
- et al.
- 2008
- SPIE Advanced Lithography 2008
Paving the way to a full chip gate level double patterning application
- Henning Haffner
- Jason Meiring
- et al.
- 2007
- SPIE Photomask Technology + EUV Lithography 2007