Fluoroalcohol-methacrylate resists for 193nm lithography
- P.R. Varanasi
- R.W. Kwong
- et al.
- 2005
- J. Photopolym. Sci. Tech.
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17 results for Mahmoud M. Khojasteh
Characterization and lithographic performance of silsesquioxane 193 nm bilayer resists
- Hiroshi Ito
- Hoa D. Truong
- et al.
- 2005
- J. Photopolym. Sci. Tech.
Post cu cmp cleaning of polyurethane pad debris
- Wei-Tsu Tseng
- Elliott Rill
- et al.
- 2013
- ECS J. Solid State Sci. Technol.
Post copper CMP hybrid clean process for advanced BEOL technology
- Wei-Tsu Tseng
- Vamsi Devarapalli
- et al.
- 2013
- IEEE Trans Semicond Manuf
ArF excimer laser resists based on fluoroalcohol
- Hiroshi Ito
- H.D. Truong
- et al.
- 2006
- Polymers for Advanced Technologies
Evolution of a 193 nm bilayer resist for manufacturing
- R.W. Kwong
- M. Khojasteh
- et al.
- 2002
- Proceedings of SPIE-The International Society for Optical Engineering
IBM 193nm bilayer resist: Materials, lithographic performance and optimization
- Ranee Kwong
- P. Rao Varanasi
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering