Publications

This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.

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15 results for U. Kwon

High performance 14nm SOI FinFET CMOS technology with 0.0174μm² embedded DRAM and 15 levels of Cu metallization
- - C.-H.C-H. Lin
  - Brian Greene
  - et al.
- 2014
- IEDM 2014
Replacement metal gate resistance in FinFET architecture modelling, validation and extendibility
- - Ruqiang Bao
  - Brian Greene
  - et al.
- 2015
- IEDM 2015
A manufacturable dual channel (Si and SiGe) high-k metal gate CMOS technology with multiple oxides for high performance and low power applications
- - S. Krishnan
  - U. Kwon
  - et al.
- 2011
- IEDM 2011
Stress liner proximity technique to enhance carrier mobility in high-κ metal gate MOSFETs
- - Dechao Guo
  - Kathryn Schonenberg
  - et al.
- 2009
- MRS Fall Meeting 2009
Gate length scaling and high drive currents enabled for high performance SOI technology using high-κ/metal gate
- - K. Henson
  - H. Bu
  - et al.
- 2008
- IEDM 2008
An Analytical Metal Resistance Model and Its Application for Sub-22-nm Metal-Gate CMOS
- - X. Miao
  - Ruqiang Bao
  - et al.
- 2015
- IEEE Electron Device Letters
Process optimizations for NBTI/PBTI for future replacement metal gate technologies
- - Barry P. Linder
  - A. Dasgupta
  - et al.
- 2016
- IRPS 2016
Simple Gate Metal Anneal (SIGMA) stack for FinFET Replacement Metal Gate toward 14nm and beyond
- - Takashi Ando
  - B. Kannan
  - et al.
- 2014
- VLSI Technology 2014
Deposited ALD SiO₂ high-k/metal gate interface for high voltage analog and I/O devices on next generation alternative channels and FINFET device structures
- - S. Siddiqui
  - M.M. Chowdhury
  - et al.
- 2013
- ECS Meeting 2013
Intrinsic dielectric stack reliability of a high performance bulk planar 20nm replacement gate high-k metal gate technology and comparison to 28nm gate first high-k metal gate process
- - W. McMahon
  - C. Tian
  - et al.
- 2013
- IRPS 2013