Publications

This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.

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15 results for U. Kwon

Bias temperature instability in high-κ/metal gate transistors - Gate stack scaling trends
- - Siddarth Krishnan
  - Vijay Narayanan
  - et al.
- 2012
- IRPS 2012
High performance bulk planar 20nm CMOS technology for low power mobile applications
- - Huiling Shang
  - Sameer Jain
  - et al.
- 2012
- VLSI Technology 2012
A novel low resistance gate fill for extreme gate length scaling at 20nm and beyond for gate-last high-k/metal gate CMOS technology
- - U. Kwon
  - K. Wong
  - et al.
- 2012
- VLSI Technology 2012
Role of point defects and HfO₂/TiN interface stoichiometry on effective work function modulation in ultra-scaled complementary metal-oxide-semiconductor devices
- - Rajan K. Pandey
  - Rajesh Sathiyanarayanan
  - et al.
- 2013
- Journal of Applied Physics
Mechanism of V_FB / V_TH shift in Dysprosium incorporated HfO₂ gate dielectric n-Type Metal-Oxide-Semiconductor devices
- - Tackhwi Lee
  - Kisik Choi
  - et al.
- 2011
- Journal of Vacuum Science and Technology B