High chi block copolymer DSA to improve pattern quality for FinFET device fabrication
- Hsinyu Tsai
- Hiroyuki Miyazoe
- et al.
- 2016
- SPIE Advanced Lithography 2016
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3 results for William J. Durand
Interfacial layers with photoswitching surface energy for block copolymer alignment and directed self-assembly
- Michael J. Maher
- Christopher M. Bates
- et al.
- 2015
- J. Photopolym. Sci. Tech.
Directed self-assembly of silicon-containing block copolymer thin films
- Michael J. Maher
- Charles T. Rettner
- et al.
- 2015
- ACS AMI